抛光耗材方面：fujimi抛光液103，compol-80，光纤抛光液，金属抛光液，氧化铈抛光皮；
5，电子化学品方面：ITO蚀刻液，BOE蚀刻液，铬蚀刻液，去胶液，显影液，晶片切割保护液；
6，供用美国安智光刻胶:AZ1500，AZ6130,等各型号光刻胶；
AZ 1500HS family was developed in 1990. The background forthis development was the fact that in making discrete and bipolarsemiconductor devices wet-etching is still very common. Forwet-etching adhesion is the most important issue. Especially onaluminium the mousebite-phenomenon is well known. To solve thisproblem we have chosen a low molecular weight novolak resinfraction resulting in significantlyimproved adhesion and also very high photospeed (therefore thesuffix High Speed). Meanwhile AZ 1500 HS has proven its superiorperformance in several production lines and lead to less rework andhigher yields.
All AZ 1500-series resists are compatible with all commondevelopers used for positive photoresists, like AZ 351B (diluted1:4), 0.5% NaOH solution and metal ion free developers like AZ726MIF. While AZ 1500-family and AZ 1514H are optimised for bestprocess latitude at 50 - 60 seconds development time, AZ1500HS-family performs best at 20 - 30 seconds development timeresulting in a high throughput lithographicprocess.
